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SemiPure Systems
SEMI F20 & ISO 14644 CLASS 1 CERTIFIED
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● VIM-VAR 316L STAINLESS STEEL • HELIUM LEAK < 1×10⁻¹⁰ MBAR·L/S

Semiconductor Ultra-High Purity Gas Delivery & Vacuum Chambers

Manufacturing mission-critical fluid components for 300mm wafer fabs, ALD/CVD process tools, and EUV lithography vacuum systems. 100% helium mass-spectrometer tested with Ra ≤ 0.13 μm (5 μin) electropolished inner surfaces.

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< 1×10⁻¹⁰
Inboard Helium Leak (mbar·L/s)
Ra ≤ 0.13 μm
Electropolish Surface (5 μin)
Class 1
ISO 14644 Cleanroom Double Bag
Design Engineering Inspector

UHP Purity & Leakage Comparator

SEMI F20 Grade
Mass Spectrometer Helium Leak Testing Protocol (SEMI F1)
Inboard Leak Rate (Tested) < 1 × 10−¹⁰ mbar·L/s
Across-the-Seat Leak Rate < 1 × 10−⁹ mbar·L/s
Testing Gas / Sensor 100% Pure Helium / Pfeiffer MS
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Fab-Grade Hardware

Precision Fluid Delivery & Vacuum Chamber Assemblies

Cleaned with 18.2 MΩ·cm UPW ultrasonic deionized water, double-bagged under high-purity nitrogen in Class 1 cleanroom environment.

SP-UHP-VALVE-316L

1/4" UHP Pneumatic Diaphragm Valves

Tied-diaphragm design with Cobalt-based Elgiloy diaphragm. Eliminates dead leg zones for pyrophoric, corrosive, and toxic semiconductor process gases.

• Body Material: 316L VIM-VAR Double Melt
• Surface Finish: Ra ≤ 0.13 μm (5 μin) EP
• Cycle Life: > 3,000,000 Actuations
SP-VACUUM-CHAMBER-300

300mm Monoblock Wafer Vacuum Chamber

5-axis CNC machined from single aerospace aluminum 6061-T6 block or 316L forging. High vacuum performance compatible with ALD, Etch, and PVD modules.

• Base Pressure: < 5 × 10−⁸ Torr
• Outgassing Rate: < 1 × 10−¹¹ mbar·L/s·cm²
• Coordinate Inspection: Zeiss CMM 100% Checked
SP-MFC-GAS-DELIVERY

Digital Thermal Mass Flow Controller (MFC)

High-accuracy digital mass flow controller for silane, NF3, chlorine, and carrier gases. Fast response time (< 0.5s) with EtherCAT / DeviceNet fieldbus interface.

• Accuracy: ± 0.5% of Setpoint
• Seal Type: All-Metal Metal-to-Metal Seal
• Gas Calibration: Multi-Gas Multi-Range Support
SEMI F20 & ASTM A262 PRACTICE E COMPLIANCE

Semiconductor Metallurgy & Purity Matrix

ALLOY ELEMENT / ATTRIBUTE STANDARD 316L SEMI F20 BASE SEMIPURE ULTRA-HIGH PURITY (VIM-VAR)
Chromium (Cr) % 16.00 - 18.00% 17.00 - 18.00% 17.50 - 18.00% (High Corrosion Resistance)
Sulfur (S) % (Inclusions) ≤ 0.030% ≤ 0.010% 0.005 - 0.010% (Optimal Weldability)
Surface Finish (Ra) Ra ≤ 0.8 μm (32 μin) Ra ≤ 0.25 μm (10 μin) Ra ≤ 0.13 μm (5 μin) Electropolished
Cr/Fe Oxide Ratio Not Specified ≥ 1.2 : 1 ≥ 1.5 : 1 (AES Depth Profile Verified)
Cleanroom Packaging Standard Polybag Class 100 Single Bag Class 1 (ISO 3) Double Bagged N2 Purged
Direct Fab Quotation

Request Semiconductor Fluid / Vacuum Quotation

Submit your gas stick P&ID schematics, chamber 3D STEP files, or valve bill of materials (BOM). Cleanroom engineers respond with material certification and transparent quotations in 1 business day.

Current RFQ Basket: SP-UHP-VALVE-316L (1/4" Pneumatic Diaphragm Valve)
● SEMI F20 Verified